研究成果

書籍:

  • 化学便覧 応用化学編 第7版、日本化学会、Ⅱ 7.3.1 PVD技術、丸善 (東京)、2014年1月、森本章治、他執筆者多数
  • 薄膜工学 第2版、日本学術振興会 薄膜第131委員会 (金原粲、吉田貞史、近藤高志)、2.2 スパッタリング、丸善 (東京)、2007年7月、森本章治、他執筆者20名
  • 薄膜ハンドブック(第2版)、日本学術振興会 薄膜第131委員会、1.1 真空蒸着 1.1.4 イオンや励起種を用いた蒸着(3) レーザアブレーション、オーム社(東京)、2008年3月、森本章治、他執筆者332名
  • 薄膜ハンドブック(第2版)、日本学術振興会 薄膜第131委員会、1.2 スパッタリング 1.2.1 はじめに、オーム社(東京)、2008年3月、森本章治、他執筆者332名
  • 薄膜ハンドブック(第2版)、日本学術振興会 薄膜第131委員会、1.2 スパッタリング(編集)、オーム社(東京)、2008年3月、森本章治、他編集委員24名
  • 最新レーザプロセシングの基礎と産業応用、電気学会、次世代レーザプロセシングとその産業応用調査専門委員会、5.3.1 表面形状評価技術、オーム社(東京)、2007年3月、森本章治、他37名 電気学会優秀技術活動賞(技術報告賞)
  • レーザープロセシング応用便覧、レーザー学会、第6章 材料創製、第1節 積層薄膜、NGTコーポレーション(東京)、2006年5月、森本章治、他60余名
  • 超微細パターニング技術-次世代のナノ・マイクロパターニングプロセス-、第37章 レーザリフトオフ法による金属薄膜のパターニング、サイエンス&テクノロジー(東京)、2006年2月、森本章治、他62名
  • レーザーマイクロ・ナノプロセッシング、杉岡幸次(理化学研究所)・矢部 明(産業技術総合研究所)、第1章 次世代材料創製 2.機能性無機薄膜 p.104-p.120、シーエムシー出版(東京)、2004年11月、森本章治、他34名
  • [図解]薄膜技術、(日本表面科学会)真下正夫・畑 朋延・小島勇夫、2.11組成制御技術(4) 79~80頁、培風館 (東京)、1999年6月、森本章治、清水立生、他49名
  • Handbook of Thin Film Process Technology、D.A.Glocker and S.I.Shah、第A1.5章 1~11頁、Institute of Physics Publishing社(ブリストル)、Sept.,1995、森本章治、清水立生、外112名
  • 応用物理データブック、応用物理学会、第11章7, 8, 9,10, 25, 26, 27, 28節、602~603頁、617~622頁、丸善 (東京)、1994年9月、清水立生、久米田稔、森本章治、外214名
  • 応用物理ハンドブック、応用物理学会、第11章3節6項 615~618頁、丸善 (東京)、1990年2月、森本章治、外214名

論文:

  • Y. Nomura, T. Tachi, T. Kawae, A. Morimoto, “Temperature dependence of ferroelectric properties and the activation energy of polarization reversal in (Pr,Mn)-codoped BiFeO3 thin films”, Phys. Stat. Sol. B, Vol.252, No.4, pp.833-838, (2015).
  • K. Nomura, Y. Kondo, T. Kawae, A. Morimoto, “Effects of SrRuO3 layer on retention properties of (Bi,Pr)(Fe,Mn)O3 film capacitor at high temperature”, ECS Solid State Letters, Vol.4, No.5, pp.N1-N4, (2015).
  • K. Yamagishi, Y. Nomura, T. Kawae, A. Morimoto, “Evaluation of resistive switching properties for BiFeO3 film capacitors using high-speed Positive-Up-Negative-Down measurement”, Trans. Mat. Res. Soc. Japan, Vol.40, pp.41-45, (2015).
  • Y. Nomura, K. Nomura, K. Kinoshita, T. Kawae, A. Morimoto, “Retention properties with high-temperature resistance in (Bi,Pr)(Fe,Mn)O3 thin film capacitor”, Phys. Stat. Sol. RRL, Vol.8, No.6, pp.536-539, (2014).
  • S. Ozaki, T. Kato, T. Kawae, A. Morimoto, “Influences of low-temperature postdeposition annealing on memory properties of Al/Al2O3/Al-rich Al-O/SiO2/p-Si charge trapping flash memory structures”, J. of Vac. Sci. and Technol. B: Microelectronics and Nanometer Structures, Vol.32, No.3, #31213, (2014).
  • S. Nakata, T. Kato, S. Ozaki, T. Kawae, A. Morimoto, “Improvement of charge trapping characteristics of Al2O 3/Al-rich Al2O3/SiO2 stacked films by thermal annealing”, Thin Solid Films, Vol.542, pp.242-245, (2013).
  • T. Kawae, Y. Seto, A. Morimoto, “Fabrication and Characterization of Metal–Ferroelectric–Insulator–Semiconductor Capacitor Structure with Ferroelectric (Bi,Pr)(Fe,Mn)O3 Thin Films”, Jpn. J. Appl. Phys., Vol.52, #04CH03, (2013).
  • T. Kawae, H. Kawasaki, T. Nakajima, N. Tokuda, S. Okamura, A. Morimoto, Y. Takano, “Fabrication of (Bi,Pr)(Fe,Mn)O3 thin films on poly-crystalline diamond substrate by chemical solution deposition and their properties”, Jpn. J. Appl. Phys., Vol.51, No., #09LA08, pp.-4, (2012).
  • Y. Ukai, S. Yamazaki, T. Kawae, A. Morimoto, “Polarization-Induced Photovoltaic Effects in Nd-Doped BiFeO3 Ferroelectric Thin Films”, Jpn. J. Appl. Phys., Vol.51, No.9, #09LE10, (2012).
  • C. Liu, T. Kawae, Y. Tsukada, A. Morimoto, H. Naganuma, T. Nakajima, S. Okamura, “Variation of ferroelectric properties in (Bi,Pr)(Fe,Mn)O 3/SrRuO3-Pt/CoFe2O4 layered film structure by applying direct current magnetic field”, J. Appl. Phys., Vol.111, No.12, #124103, (2012).
  • S. Nakata, R. Maeda, T. Kawae, A. Morimoto, T. Shimizu, “Charge trapping characteristics of Al2O3/Al-rich Al2O3/SiO2 stacked films fabricated by radio-frequency magnetron co-sputtering”, Thin Solid Films, Vol.520, No.3, pp.1091 -1095, (2011).
  • T. Kawae, J. Hu, H. Naganuma, T. Nakajima, Y. Terauchi, S. Okamura, A. Morimoto, “Hysteresis loops of polarization and magnetization in (BiNd 0.05)(Fe0.97Mn0.03)O3/Pt/CoFe2O4 layered epitaxial thin film grown by pulsed laser deposition”, Thin Solid Films, Vol.519, No.22, pp.7727-7730, (2011).
  • T. Kawae, T. Tsukada, Y. Terauchi, T. Nakajima, Y. Nomura, S. Okamura, A. Morimoto, “Influence of SrRuO3 bottom electrode thickness on electric properties of (Bi,Pr)(Fe,Mn)O3 Ultra-thin film capacitor”, Jpn. J. Appl. Phys., Vol.50, No.9, #09NA09-, (2011).
  • Z. P. Wang, A. Morimoto, T. Kawae, H. Ito, K. Masugata, “Growth of preferentially-oriented AlN films on amorphous substrate by pulsed laser deposition”, Physics Letters, Section A, Vol.375, No.33, pp.3007-3011, (2011).
  • T. Kawae, Y. Hori, T. Nakajima, H. Kawasaki, N. Tokuda, S. Okamura, Y. Takano, A. Morimoto, “Structure and Electrical Properties of (Pr, Mn)-Codoped BiFeO3/B-Doped Diamond Layered Structure”, Electrochemical and Solid-State Letters, Vol.14, No.6, pp.G31-G34, (2011).
  • M. Ali, T. Inokuma, A. Al.-Hajry, H. Kobayashi, I. Umezu, A. Morimoto, “Roles of SiH4 in Growth, Structural Changes and Optical Properties Of Nanocrystalline Silicon Thin Films”, AIP Conf. Proc., Vol.1370, pp.68-74, (2011).
  • T. Kawae, Y. Terauchi, T. Nakajima, S. Okamura, A. Morimoto, “Influences of Pr and Mn co-substitution on crystallinity and electric properties of BiFeO3 thin films”, Journal of the Ceramic Society of Japan, Vol.118, No.1380, pp.652-655, (2010).
  • H. Shima, T. Kawae, A. Morimoto, M. Matsuda, M. Suzuki, T. Tadokoro, H. Naganuma, T. Iijima, T. Nakajima, S. Okamura, “Optical Properties of BiFeO3-System Multiferroic Thin Films”, Jpn. J. Appl. Phys., Vol.48, No.9, pp.09KB01-, (2009).
  • T. Kawae, Y. Fukuda, K. Morito, K. Munetomo, A. Morimoto, “Hysteresis Behavior of Capacitance–Voltage Curve in (Ba0.6Sr0.4)TiO3 Thick Films Caused by Strained Heterostructure”, Jpn. J. Appl. Phys., Vol.48, No.9, #09KA12, (2009).
  • Y. Zhou, K. Sasaki, T. Kawae, A. Morimoto, “Thickness dependence of the structural and dielectric properties of epitaxial ZrO2 films grown by limited reaction sputtering”, Journal of Physics D: Applied Physics, Vol.42, No.20, #205406-, (2009).
  • T. Kawae, Y. Terauchi, H. Tsuda, M. Kumeda, A. Morimoto, “Improved leakage and ferroelectric properties of Mn and Ti codoped BiFeO3 thin films”, Appl. Phys. Lett., Vol.94, No.11, pp.112904-, (2009).
  • T. Kawae, H. Tsuda, H. Naganuma, S. Yamada, M. Kumeda, S. Okamura, A. Morimoto, “Composition Dependence in BiFeO3 Film Capacitor with Suppressed Leakage Current by Nd and Mn Cosubstitution and Their Ferroelectric Properties”, Jpn. J. Appl. Phys., Vol.47, No.9, pp.7586-7589, (2008).
  • S. Takahara, A. Morimoto, T. Kawae, M. Kumeda, S. Yamada, S. Ohtsubo, Y. Yonezawa, “Fatigue-resistant epitaxial Pb(Zr,Ti)O3 capacitors on Pt electrode with ultra-thin SrTiO3 template layers”, Thin Solid Films, Vol.516, No.23, pp.8393-8398, (2008).
  • T.-Y. Kim, T. Kawae, N. Ikegami, S. Yamada, Y. Yonezawa, K. Takahashi, A. Morimoto, M. Kumeda, “Effect of Microstructure and Crystalline Orientation of Pt Single- or Pt/Ru Bilayer-Electrodes on the Work Function and Leakage Current of SrTiO3 Capacitors”, Jpn. J. Appl. Phys., Vol.47, No.8, pp.6374-6379, (2008).
  • S. Nakata, S. Nagai, M. Kumeda, T. Kawae, A. Morimoto, T. Shimizu, “Etching rate, optical transmittance and charge trapping characteristics of Al-rich Al2O3 thin film fabricated by RF magnetron co-sputtering”, J. Vac. Sci. and Technol. B, Vol.26, No.4, pp.1373-1378, (2008).
  • T.  Kawae, H. Tsuda, A. Morimoto, “Reduced Leakage Current and Ferroelectric Properties in Nd and Mn Codoped BiFeO3 Thin Films”, Appl. Phys. Express, Vol.1, No.51601, pp.1-3, (2008).
  • T. Kawae, H. Tsuda, M. Shiomoto, S. Yamada, M. Nagao, A. Morimoto, M. Kumeda, “Fabrication of BiFeO3 Thick Films by a Simple Liquid-Phase Epitaxial Growth Technique”, Jpn. J. Appl. Phys., Vol.47, No.1, pp.237-239, (2008).
  • Y. Li, M. Kumeda, A. Morimoto, T. Kawae, G. Chen, “Structural properties of silicon thin films prepared by hot-wire-assisted electron cyclotron resonance chemical vapor deposition”, Jpn. J. Appl. Phys., Vol.46, No.2, pp.751-755, (2007).
  • M. Kumeda, Y. Sekizawa, A. Morimoto, T. Shimizu, “Environment of Er doped in a-Si:H and its relation with photoluminescence spectra”, Materials Research Society Symposium Proceedings, Vol.910, pp.131-136, (2007).
  • M. Kumeda, M. Takahashi, A. Morimoto, T. Shimizu, “Stark splitting in photoluminescence spectra of Er in a-Si:H”, Materials Research Society Symposium Proceedings, Vol.862, pp.501-506, (2005).
  • M. Kumeda, R. Sakai, A. Morimoto, T. Shimizu, “Light-intensity dependence of the staebler-wronski effect in a-Si:H with various densities of defects”, Materials Research Society Symposium Proceedings, Vol.862, pp.463-468, (2005).
  • A. Morimoto, H. Tanimura, H. Yang, S. Ohtsubo, M. Kumeda, X. Chen, “Platinum film patterning by laser lift-off using hydrocarbon film on insulating substrates”, Applied Physics A: Materials Science & Processing, Vol.79, No.4-6, pp.1015-1018, (2004).
  • M. Kumeda, M. Shimada, S. Kimura, A. Morimoto, T. Shimizu, “Light-intensity Dependence of Photocreated Defects in Hydrogenated Amorphous Silicon-Nitrogen Alloy Films”, Jpn. J. Appl. Phys., Vol.42, No.3A, pp.L255-L256, (2003).
  • A. Masuda, S. Usui, Y. Yamanaka, Y. Yonezawa, T. Minamikawa, M. Suzuki, A. Morimoto, M. Kumeda, T. Shimizu, “Oxidation process in pulsed laser ablation of Si with various ambients”, Thin Solid Films, Vol.416, No.1/2, pp.106-113, (2002).
  • S. Ohtsubo, S. Yamada, Y. Yonezawa, A. Morimoto, T. Shimizu, “Temperature simulation of Cooling Process of Ge Droplets in Laser Droplet Epitaxy”, Jpn. J. Appl. Phys., Vol.41, No.6A, pp.3880-3884, (2002).
  • X. Chen, A. Morimoto, M. Kumeda, T. Shimizu, “Thin Film Patterning by Laser Lift-Off”, Jpn. J. Appl. Phys., Vol.41, No.5A, pp.3099-3100, (2002).
  • S. Yamada, Y. Nishibe, S. Ohtsubo, Y. Yonezawa, A. Morimoto, T. Shimizu, K. Ishida, Y. Masaki, “Preparation of Twin- and Crack-Free LiNbO3 Films by Pulsed Laser Ablation Using Nucleation Process at High Temperature”, Jpn. J. Appl. Phys., Vol.41, No.3B, pp.L275-L277, (2002).
  • S. Yamada, Y. Nishibe, M. Saizaki, H. Kitajima, S. Ohtsubo, A. Morimoto, T. Shimizu, K. Ishida, Y. Masaki, “Rotational Honeycomb Epitaxy of Ru Thin Films on Sapphire (0001) Substrate”, Jpn. J. Appl. Phys., Vol.41, No.2B, pp.L206-L208, (2002).
  • X. Chen, A. Morimoto, K. Nagai, M. Kumeda, T. Shimizu, “Electron-Beam-Induced Nucleation Centers and Selective Deposition of Thin Zinc Films”, Jpn. J. Appl. Phys., Vol.41, No.2A, pp.775-777, (2002).
  • A. Morimoto, K. Asada, T. Minamikawa, Y. Yonezawa, T. Shimizu, “Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas”, Thin Solid Films, Vol.395, No.0, #, pp.51-54, (2001).
  • M. Wang, A. P. Huang, B. Wang, H. Yan, Z. Y. Yao, A. Morimoto, T. Shimizu, “Bias effects on structure of sputtered SiC films”, Materials Science and Engineering B, Vol.85, No.1, pp.25-27, (2001).
  • S. Yamada, S. Oguri, A. Morimoto, T. Shimizu, T. Minamikawa, Y. Yonezawa, “Preparation of Epitaxial Ge Film on Si by Pulsed Laser Ablation using Molten Droplets”, Jpn. J. Appl. Phys., Vol.39, No.4A, pp.L278-L280, (2000).
  • A. Morimoto, Y. Maeda, T. Minamikawa, Y. Yonezawa, T. Shimizu, “LPE-Like Crystal Growth of YIG Ferrimagnetic Thin Films by Pulsed Laser Ablation with Molten Droplets”, Appl. Phys. A, Vol.69, No.7, pp.S703-S706, (1999).
  • Y. Yonezawa, T. Minamikawa, A. Morimoto, T. Shimizu, “Removal of Surface Oxides on Copper by Pulsed Laser Irradiation”, Jpn. J. Appl. Phys., Vol.37, No.8, pp.4505-4509, (1998).
  • A. Masuda, S. Morita, H. Shigeno, A. Morimoto, T. Shimizu, J. Wu, H. Yaguchi, K. Onabe, “Fabrication of Pb(Zr,Ti)O3/MgO/GaN/GaAs Structure for Optoelectronic Device Applications”, J. Crystal Growth, Vol.190, No., pp.227-230, (1998).
  • A. Morimoto, H. Takizawa, Y. Yonezawa, M. Kumeda, T. Shimizu, “Photoluminescence Enhanced by Excimer Laser Irradiation in Silicon Oxide Films Prepared by Pulsed Laser Ablation”, J. Non-Crystal. Sol., Vol.0, No., pp.493-497, (1998).
  • A. Morimoto, H. Shigeno, S. Morita, Y. Yonezawa, T. Shimizu, “Effect of Nitrogen Gas on Preparation of Ti-Al-N Thin Films by Pulsed Laser Ablation”, Applied Surface Science, Vol.127-129, pp.994-998, (1998).
  • A. Morimoto, K. Takezawa, T. Minamikawa, Y. Yonezawa, T. Shimizu, “Low-temperature Growth of YBCO Thin Films by Pulsed Laser Ablation in Reductive Environment”, Applied Surface Science, Vol.127-129, pp.963-967, (1998).
  • Y. Yonezawa, T. Minamikawa, K. Matsuda, K. Takezawa, A. Morimoto, T. Shimizu, “Size Distribution of Droplets in Film Prepared by Pulsed Laser Ablation”, Applied Surface Science, Vol.127-129, pp.639-644, (1998).
  • A. Masuda, Y. Yonezawa, A. Morimoto, M. Kumeda, T. Shimizu, “Influence of Pb incorporation on light-Induced phenomena in amorphous Ge100-x-yPbxSy thin films”, J. Non-Crystal. Sol., Vol.217, No.2/3, pp.121-135, (1997).
  • A. Masuda, S. Yoshimoto, Y. Yonezawa, A. Morimoto, M. Kumeda, T. Shimizu, “Nitrogen- and Ammonia-Plasma Nitridation of Hydrogenated Amorphous Silicon”, Applied Surface Science, Vol.113/114, pp.610-613, (1997).
  • A. Masuda, K. Matsuda, S. Usui, Y. Yonezawa, T. Minamikawa, A. Morimoto, T. Shimizu, “Ambient-pressure Influence on Droplet Formation and Thickness Distribution in Pulsed Laser Ablation”, Materials Science and Engineering B, Vol.41, No., pp.161-165, (1996).
  • T. Nakamura, A. Masuda, A. Morimoto, T. Shimizu, “Influence of Buffer Layers on Lead Magnesium Niobate Titanate Thin Films Prepared by Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.35, No.9A, pp.4750-4754, (1996).
  • Y. Yonezawa, K. Matsuda, A. Morimoto, T. Shimizu, “Preparation of Bi-Iron-Garnet Films on Platinized Si Substrate with Bi-Substituted Y-Iron-Garnet Template Layer”, The Review of Laser Engineering, Vol.24, No.9, pp.971-977, (1996).
  • A. Morimoto, H. Kawasaki, T. Minamikawa, T. Shimizu, “Microwave-Modulated Nonresonant Microwave Absorption in YBa2Cu3Ox High-Tc Superconductors”, Physica C, Vol.268, No.0, pp.53-60, (1996).
  • A. Masuda, Y. Yonezawa, A. Morimoto, M. Kumeda, T. Shimizu, “X-ray photoelectron spectroscopy and electron spin resonance studies on O2and N2O plasma oxidation of silicon”, Materials Science and Engineering B, Vol.39, pp.173-178, (1996).
  • T. Minamikawa, M. Tazoe, K. Segawa, Y. Yonezawa, A. Morimoto, T. Shimizu, “Preparation of a-axis-oriented YBa2Cu3Ox superconducting films on MgO substrates with PrBa2Cu3Ox buffer layers”, Physica C, Vol.267, No.3/4, pp.330-336, (1996).
  • A. Masuda, K. Matsuda, Y. Yonezawa, A. Morimoto, T. Shimizu, “Mechanism of Stoichiometric Deposition for Volatile Elements in Multimetal-Oxide Films Prepared by Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.35, No.2B, pp.L237-L240, (1996).
  • A. Morimoto, Y. Yamanaka, T. Shimizu, “Preparation of Ti-Al-N Electrode Films by Pulsed Laser Ablation for Lead-Zirconate-Titanate Film Capacitors”, Jpn. J. Appl. Phys., Vol.35, No.2B, pp.L227-L230, (1996).
  • A. Masuda, Y. Yamanaka, M. Tazoe, T. Nakamura, A. Morimoto, T. Shimizu, “Preparation and Crystallographic Characterizations of Highly Oriented Pb(Zr0.52Ti0.48)O3 Films and MgO Buffer Layers on (100)GaAs and (100)Si by Pulsed Laser Ablation”, J. Crystal Growth, Vol.158, pp.84-88, (1996).
  • A. Masuda, Y. Yamanaka, M. Tazoe, Y. Yonezawa, A. Morimoto, T. Shimizu, “Highly Oriented Pb(Zr,Ti)O3 Thin Films Prepared by Pulsed Laser Ablation on GaAs and Si Substrates with MgO Buffer Layer”, Jpn. J. Appl. Phys., Vol.34, No.9B, pp.5154-5157, (1995).
  • T. Nakamura, Y. Yamanaka, A. Morimoto, T. Shimizu, “Effect of Oxygen Pressure on (BaxSr1-x)TiO3 Thin Films by Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.34, No.9B, pp.5150-5153, (1995).
  • A. Morimoto, Y. Yamanaka, T. Shimizu, “Fatigue Behavior in Lead-Zirconate-Titanate Thin-Film Capacitors Prepared by Pulsed Laser Ablation on Ni-Alloy Electrodes”, Jpn. J. Appl. Phys., Vol.34, No.8A, pp.4108-4113, (1995).
  • T. Minamikawa, T. Suzuki, Y. Yonezawa, K. Segawa, A. Morimoto, T. Shimizu, “Annealing Temperature Dependence of MgO Substrates on the Quality of YBa2Cu3Ox Films Prepared by Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.34, No.8A, pp.4038-4042, (1995).
  • H. Min, I. Fukushi, A. Masuda, A. Morimoto, M. Kumeda, T. Shimizu, “Interfacial Neutral- and Charged-Dangling -Bond Densities between Hydrogenated Amorphous Silicon and Hydrogenated Amorphous Silicon Nitride in Top Nitride and Bottom Nitride Structure”, Appl. Phys. Lett., Vol.66, No.20, pp.2718-2720, (1995).
  • A. Masuda, Y. Yonezawa, A. Morimoto, T. Shimizu, “NH3-Plasma Nitridation Process of (100)GaAs Surface Observed by Angle-Dependent X-ray Photoelectron Spectroscopy”, Jpn. J. Appl. Phys., Vol.34, No.2B, pp.1075-1079, (1995).
  • A. Masuda, Y. Yonezawa, A. Morimoto, M. Kumeda, T. Shimizu, “Ultrathin SiO2 Films on Si Formed by N2O-plasma Oxidation Technique”, Applied Surface Science, Vol.81, pp.277-280, (1994).
  • T. Ogawa, H. Kidoh, H. Yashima, A. Morimoto, T. Shimizu, “Ferroelectric Properties of PZT Thin Films Deposited by Laser Ablation on Nickel Alloy Electrode for use with Silicon Substrate”, Ferroelectrics, Vol.157, pp.381-386, (1994).
  • T. Minamikawa, T. Suzuki, A. Morimoto, T. Shimizu, K. Segawa, “Critical Current Density Improved by Laser Irradiation on Growing Surface in YBa2Cu3Ox Superconducting Films”, Physica C, Vol.231, No.1/2, pp.118-122, (1994).
  • Y. Yonezawa, K. Segawa, S. Katayama, T. Minamikawa, A. Morimoto, T. Shimizu, “Reduction of Droplet Formation by Reducing Target Etching Rate in Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.33, No.8B, pp.L1178-L1180, (1994).
  • H. Kidoh, H. Yashima, A. Morimoto, T. Shimizu, “Magneto-Optical Characteristics of Bi-Substituted Rare-Earth Iron Garnet Films Prepared by Laser Ablation”, Jpn. J. Appl. Phys., Vol.33, No.0, pp.4094-4099, (1994).
  • A. Morimoto, T. Matsuki, T. Minamikawa, T. Shimizu, “Nonresonant Microwave Absorption and Critical Current Density in YBa2Cu3Ox Films Prepared by Laser Ablation”, Physica C, Vol.220, pp.332-340, (1994).
  • T. Minamikawa, T. Suzuki, K. Segawa, A. Morimoto, T. Shimizu, “Laser-Irradiation Induced a-Axis Orientation in c-Axis-Oriented YBa2Cu3Ox Films Prepared by Pulsed Laser Ablation”, Jpn. J. Appl. Phys., Vol.33, No.1B, pp.L98-L101, (1994).
  • A. Masuda, I. Fukushi, Y. Yonezawa, T. Minamikawa, A. Morimoto, M. Kumeda, T. Shimizu, “Spectroscopic Study on N2O-Plasma Oxidation of Hydrogenated Amorphous Silicon and Behavior of Nitrogen”, Jpn. J. Appl. Phys., Vol.32, No.6A, pp.2794-2802, (1993).
  • H. Kidoh, T. Ogawa, H. Yashima, A. Morimoto, T. Shimizu, “Preparation of Pb(Zr,Ti)O3 Films on Si Substrate by Laser Ablation”, Jpn. J. Appl. Phys., Vol.31, No.9B, pp.2965-2967, (1992).
  • A. Masuda, A. Morimoto, M. Kumeda, T. Shimizu, Y. Yonezawa, T. Minamikawa, “Novel Oxidation Process of Hydrogenated Amorphous Silicon Utilizing Nitrous Oxide Plasma”, Appl. Phys. Lett., Vol.61, No.7, pp.816-818, (1992).
  • T. Shimizu, M. Matsumoto, M. Yoshita, M. Iwami, A. Morimoto, M. Kumeda, “Influence of N, O and C Impurities in a-Si:H”, J. Non-Cryst. Sol., Vol.137/138, pp.391-394, (1991).
  • A. Masuda, M. Kumeda, A. Morimoto, T. Shimizu, “Light-Induced ESR and Disappearance of Photodarkening in Amorphous Ge-S Films Alloyed with Lead”, J. Non-Cryst. Sol., Vol.137/138, pp.985-988, (1991).
  • H. Yan, A. Morimoto, M. Kumeda, T. Shimizu, “Thermal Equilibrium Behavior of Defect Density and Conductivity in a-Si1-xGex:H Alloys”, J. Non-Cryst. Sol., Vol.137/138, pp.199-202, (1991).
  • M. Kumeda, N. Awaki, H. Yan, A. Morimoto, T. Shimizu, “ESR in Silicon Nitride Films Prepared Using Nitrogen Isotope”, J. Non-Cryst. Sol., Vol.137/138, pp.887-890, (1991).
  • J. Li, M. Shibata, M. Yoshita, A. Morimoto, M. Kumeda, T. Shimizu, “Fluorination and Superconductivity of T’ Phase Nd2CuO4-y”, Physica C, Vol.185-189, pp.613-614, (1991).
  • A. Morimoto, M. Makida, T. Shimizu, “Non-resonant Microwave Absorption and Microscopic Jc in Ba2YCu30x Super-conductors Decomposed from Ba2YCu40x”, Physica C, Vol.185-189, pp.2319-2320, (1991).
  • T. Minamikawa, Y. Yonezawa, K. Segawa, S. Otsubo, S. Mizukami, A. Morimoto, T. Shimizu, “Effect of Pulsed Laser Irradiation on Growing Surface of Ba-Y-Cu-O Superconducting Films”, Physica C, Vol.185-189, No., pp.1969-1970, (1991).
  • A. Morimoto, M. Matsumoto, M. Yoshita, M. Kumeda, T. Shimizu, “Doping Effect of Oxygen or Nitrogen Impurity in Hydrogenated Amorphous Silicon Films”, Appl. Phys. Lett., Vol.59, No.17, pp.2130-2132, (1991).
  • H. Kidoh,, T. Ogawa,, H. Yashima,, A. Morimoto,, T. Shimizu, “Influence of Laser Fluence on Structural and Ferroelectric Properties of Lead-Zirconate-Titanate Thin Films Prepared by Laser Ablation”, Jpn. J. Appl. Phys., Vol.30, No.9B, pp.2167-2169, (1991).
  • A. Morimoto, Y. Nishio, T. Shimizu, “Reduction of Interface Defect Density by Hydrogen Dilution in a-Si:H/ZnS Multilayer Films”, Jpn. J. Appl. Phys., Vol.30, No.8, pp.1798-1802, (1991).
  • H. Kidoh, A. Morimoto, T. Shimizu, “Synthesis of Ferromagnetic Bi-substituted Yttrium Iron Garnet Films by Laser Ablation”, Appl. Phys. Lett., Vol.59, No.2, pp.237-239, (1991).
  • H. Kidoh, T. Ogawa, A. Morimoto, T. Shimizu, “Ferroelectric Properties of Lead-zirconate-titanate Films Prepared by Laser Ablation”, Appl. Phys. Lett., Vol.58, No.25, pp.2910-2912, (1991).
  • H. Yan, A. Morimoto, M. Kumeda, T. Shimizu, “Thermal Equilibration of Defect Density in Hydrogenated Amorphous Silicon-Germanium Alloys”, Jpn. J. Appl. Phys., Vol.30, No.7B, pp.L1235-L1237, (1991).
  • M. Kumeda, N. Awaki, H. Yan, A. Morimoto, T. Shimizu, T. Watanabe, “Comparison between ESR and CPM for the Gap States in a-Si-Ge:H”, Jpn. J. Appl. Phys., Vol.30, No.6B, pp.L1079-L1082, (1991).
  • 森本章治, 清水立生, “レーザアブレーション法による薄膜体積”, J. Advanced Sci., Vol.3, No.1, pp.37-40, (1991).
  • A. Moto, A. Morimoto, M. Kumeda, T. Shimizu, “ESR and Raman Studies on Mn-Substituted Ba-Y-Cu-O”, Supercond. Sci. Technol., Vol.3, No.12, pp.579-582, (1990).
  • T. Shimizu, A. Morimoto, “Preparation of Ba-Y-Cu-O Films by Laser Ablation (Invited)”, Int. J. Appl. Electro-Magnetics in Materials, Vol.1, pp.91-97, (1990).
  • A. Morimoto, M. Matsumoto, M. Kumeda, T. Shimizu, “Effect of Reduction in Impurity Content for a-Si:H Films”, Jpn. J. Appl. Phys., Vol.29, No.10, pp.L1747-L1749, (1990).
  • M. Kumeda, M. Yoshida, A. Morimoto, T. Shimizu, “Effect of Charged Defects on Properties of Amorphous Si-Based Alloys”, Jpn. J. Appl. Phys., Vol.29, No.9, pp.L1578-L1581, (1990).
  • A. Moto, A. Morimoto, T. Shimizu, “Chemical and Structural Investigations on the Bi-based Oxide Superconductors”, Mol. Cryst. Liq. Cryst., Vol.184, pp.285-289, (1990).
  • X. Xu, H. Sasaki, A. Morimoto, M. Kumeda, T. Shimizu, “Thermal-equilibrium Defects in Undoped Hydrogenated Amorphous Silicon, Silicon-carbon, and Silicon-nitrogen”, Phys. Rev. B, Vol.41, No.14, pp.10049-10057, (1990).
  • S. Otsubo, T. Maeda, T. Minamikawa, Y. Yonezawa, A. Morimoto, T. Shimizu, “Thermal Analysis of Target Surface in the Ba-Y-Cu-O Film Preparation by Laser Ablation Method”, Jpn. J. Appl. Phys., Vol.29, No.1, pp.L73-L76, (1990).
  • S. Otsubo, T. Maeda, T. Minamikawa, Y. Yonezawa, A. Morimoto, T. Shimizu, “Preparation of Pb(Zr0.52Ti0.48)03 Films by Laser Ablation”, Jpn. J. Appl. Phys., Vol.29, No.1, pp.L133-L136, (1990).
  • 米沢保人, 南川俊治, 大坪 茂, 前田俊裕, 本 昭浩, 森本章治, 清水立生, “レーザを利用した酸化物超伝導薄膜の作製”, Ionics, Vol.168, pp.175-178, (1989).
  • T. Shimizu, X. Xu, H. Sasaki, A. Morimoto, M. Kumeda, “Thermal Equilibration in Hydrogenated Amorphous Silicon-Based Films”, J. Non-Cryst. Sol., Vol.114, pp.648-650, (1989).
  • T. Shimizu, H. Kidoh, M. Matsumoto, A. Morimoto, M. Kumeda, “Photo-Created Defects in a-Si:H as Elucidated by ESR, LESR and CPM”, J. Non-Cryst. Sol., Vol.114, pp.630-632, (1989).
  • S. Otsubo, T. Minamikawa, Y. Yonezawa, T. Maeda, A. Morimoto, T. Shimizu, “Crystallization Induced by Laser Irradiation in Ba-Y-Cu-O Superconducting Films Prepared by Laser Ablation”, Jpn. J. Appl. Phys., Vol.28, No.11, pp.2211-2218, (1989).
  • A. Moto, A. Morimoto, T. Shimizu, “Structural Analysis on Tc Variation of Bi2Sr2-xCa1+xCu2O8+y”, Jpn. J. Appl. Phys., Vol.28, No.7, pp.L1144-L1147, (1989).
  • A. Morimoto, K. Mizushima, T. Shimizu, “Interface Structure of a-Si:H/ZnS Multilayer Films Elucidated from Electron-Spin Resonance and Infrared-Absorption Measurements”, J. Appl. Phys., Vol.65, No.12, pp.4739-4746, (1989).
  • T. Shimizu, H. Kidoh, A. Morimoto, M. Kumeda, “Nature of Localized State in Hydrogenated Si-Based Amorphous Semiconductors Films Elucidated from LESR and CPM”, Jpn. J. Appl. Phys., Vol.28, No.4, pp.586-592, (1989).
  • S. Otsubo, T. Minamikawa, Y. Yonezawa, T. Maeda, A. Moto, A. Morimoto, T. Shimizu, “Preparation of Ba-Y-Cu-O Superconducting Films by Laser Ablation with and without Laser Irradiation on Growing Surface”, Jpn. J. Appl. Phys., Vol.27, No.12, pp.L2442-L2444, (1988).
  • T. Shimizu, X. Xu, H. Kidoh, A. Morimoto, M. Kumeda, “Surface and Bulk Defects in Hydrogenated Amorphous Silicon and Silicon-based Alloy Films”, J. Appl. Phys., Vol.64, No.10, pp.5045-5049, (1988).
  • S. Otsubo, M. Saito, A. Morimoto, M. Kumeda, T. Shimizu, “a-Si1-xOx:H Films Prepared by Direct Photo-CVD Using CO2 Gas”, Jpn. J. Appl. Phys., Vol.27, No.11, pp.L1999-L2002, (1988).
  • X. Xu, A. Okumura, A. Morimoto, M. Kumeda, T. Shimizu, “Thermally Induced Metastable Defects in Hydrogenated Amorphous Silicon and Silicon-carbon Alloy Films”, Phys. Rev. B, Vol.38, No.12, pp.8371-8376, (1988).
  • T. Minamikawa, Y. Yonezawa, S. Otsubo, T. Maeda, A. Moto, A. Morimoto, T. Shimizu, “Preparation of Ba2YCu3Ox Superconducting Films by Laser Evaporation and Rapid Laser Annealing”, Jpn. J. Appl. Phys., Vol.27, No.4, pp.L619-L621, (1988).
  • A. Morimoto, T. Maeda, A. Moto, M. Kumeda, T. Shimizu, “ESR and X-ray Diffraction Studies on Ba-Y-Cu-O Superconductors”, Jpn. J. Appl. Phys., Vol.27, No.3, pp.407-410, (1988).
  • X. Xu, A. Morimoto, M. Kumeda, T. Shimizu, “Thermal Equilibrium Process in Undoped Hydrogenated Amorphous Silicon and Silicon-carbon Alloy Films”, Appl. Phys. Lett., Vol.52, No.8, pp.622-624, (1988).
  • A. Morimoto, K. Mizushima, T. Shimizu, “a-Si:H/ZnS Superlattice”, J. Non-Cryst. Sol., Vol.0, No., pp.943-946, (1987).
  • X. Xu, A. Morimoto, M. Kumeda, T. Shimizu, “ESR and Constant Photocurrent Studies of Surface and Bulk Defects in a-Si:H”, Jpn. J. Appl. Phys., Vol.26, No.11, pp.L1818-L1820, (1987).
  • A. Morimoto, H. Noriyama, T. Shimizu, “Structure and Defects in Amorphous Si-O Films”, Jpn. J. Appl. Phys., Vol.26, No.1, pp.22-27, (1987).
  • A. Morimoto, I. Kobayashi, M. Kumeda, T. Shimizu, “Hydrogen Evolution from Amorphous Si-N Films”, Jpn. J. Appl. Phys., Vol.25, No.9, pp.L752-L754, (1986).
  • A. Morimoto, T. Shimizu, “Synthesis and Characterization of Amorphous Si-Zn-S Alloy Films”, Jpn. J. Appl. Phys., Vol.25, No.9, pp.1275-1279, (1986).
  • M. Kumeda, H. Yokomichi, A. Morimoto, T. Shimizu, “Light-Induced Effects and Their Annealing Behavior in a-Si:H”, Jpn. J. Appl. Phys., Vol.25, No.8, pp.L654-L656, (1986).
  • G. Chen, F. Zhang, X. Xu, A. Morimoto, M. Kumeda, T. Shimizu, “LESR Studies on Doped a-Si-C:H Films”, Acta Physica Sinica, Vol.35, No.4, pp.517-522, (1986).
  • M. Kumeda, M. Uno, A. Morimoto, T. Shimizu, “Light-Induced Effects in a-Si:H Studied by ESR and Electrical Measurements”, Jpn. J. Appl. Phys., Vol.25, No.4, pp.L325-L327, (1986).
  • T. Shimizu, M. Kumeda, A. Morimoto, H. Yokomichi, N. Ishii, “Photo-Created Defects in Si-Based Amorphous Semiconductors”, J. Non-Cryst. Sol., Vol.77/78, pp.377-380, (1985).
  • A. Morimoto, S. Takamori, T. Shimizu, “New Type of Amorphous Alloy; Si-ZnS”, J. Non-Cryst. Sol., Vol.77/78, pp.965-968, (1985).
  • A. Morimoto, Y. Tsujimura, M. Kumeda, T. Shimizu, “Properties on Hydrogenated Amorphous Si-N Prepared by Various Methods”, Jpn. J. Appl. Phys., Vol.24, No.11, pp.1394-1398, (1985).
  • A. Morimoto, T. Kataoka, T. Shimizu, “Annealing Studies on Hydrogenated Amorphous Silicon-Tin Films”, Jpn. J. Appl. Phys., Vol.24, No.9, pp.1122-1129, (1985).
  • H. Yokomichi, M. Kumeda, A. Morimoto, T. Shimizu, “ESR Studies on the Light-Induced Effect in Si-Based Amorphous Semiconductors”, Jpn. J. Appl. Phys., Vol.124, No.8, pp.L569-L571, (1985).
  • M. Kumeda, Y. Tsujimura, Y. Yonezawa, A. Morimoto, T. Shimizu, “NMR and ESR Studies on a-Si1-xGex:H Prepared by Magnetron Sputtering”, Solid State Commun., Vol.55, No.5, pp.409-412, (1985).
  • G. Chen, A. Morimoto, M. Kumeda, T. Shimizu, “ESR Studies on Doped Hydrogenated Amorphous Silicon-Carbon”, Phys. Stat. Sol.(a), Vol.89, No.2, pp.K181-K183, (1985).
  • A. Morimoto, T. Kataoka, T. Shimizu, “ESR and Raman Studies on Hydrogenated Amorphous Si-Sn”, Jpn. J. Appl. Phys., Vol.23, No.10, pp.L812-L814, (1984).
  • A. Morimoto, T. Kataoka, M. Kumeda, T. Shimizu, “Annealing and Crystallization Processes in Tetrahedrally Bonded Binary Amorphous Semiconductors”, Philos. Mag. B, Vol.50, No.4, pp.517-537, (1984).
  • M. Yoshida, K. Morigaki, Y. Sano, S. Nitta, A. Morimoto, T. Shimizu, “Optically Detected Magnetic Resonance in Hydrogenated Amorphous Si1-xCx”, J. Non-Cryst. Sol., Vol.59/56, pp.573-576, (1983).
  • M. Kumeda, Y. Yonezawa, A. Morimoto, S. Ueda, T. Shimizu, “H NMR μc-Si:H”, J. Non-Cryst. Sol., Vol.59/56, pp.775-778, (1983).
  • A. Morimoto, M. Kumeda, T. Shimizu, “Crystallization Process in Tetrahedrally Bonded Binary Amorphous Semiconductors”, J. Non-Cryst. Sol., Vol.59/56, pp.537-540, (1983).
  • A. Morimoto, S. Oozora, M. Kumeda, T. Shimizu, “Annealing Behavior of Hydrogenated Amorphous Silicon-Nitrogen Alloy Films Prepared by Sputtering”, Phys. Stat. Sol. (b), Vol.119, No.2, pp.715-720, (1983).
  • A. Morimoto, S. Oozora, M. Kumeda, T. Shimizu, “Raman Studies on Local Structural Disorder in Silicon-Based Amorphous Semiconductor Films”, Solid State Commun., Vol.47, No.10, pp.773-777, (1983).
  • A. Morimoto, T. Miura, M. Kumeda, T. Shimizu, “Temperature-Independent Photoluminescence in Amorphous Si1-xCx:(F,H) Films with Low Defect Density”, Jpn. J. Appl. Phys., Vol.22, No.6, pp.908-911, (1983).
  • T. Shimizu, S. Oozora, A. Morimoto, M. Kumeda, N. Ishii, “Defects in Amorphous Si-N Films Prepared by RF Sputtering”, Solar Energy Materials, Vol.8, No.1-3, pp.311-317, (1982).
  • A. Morimoto, T. Miura, M. Kumeda, T. Shimizu, “Defects in Hydrogenated Amorphous Silicon-Carbon Alloy Films Prepared by Glow Discharge Decomposition and Sputtering”, J. Appl. Phys., Vol.53, No.11, pp.7299-7305, (1982).
  • I. Watanabe, Y. Hata, A. Morimoto, T. Shimizu, “Photoluminescence in Glow Discharge Deposited Amorphous Si1-xCx Films”, Jpn. J. Appl. Phys., Vol.21, No.10, pp.L613-L615, (1982).
  • K. Nakazawa, S. Ueda, M. Kumeda, A. Morimoto, T. Shimizu, “NMR and IR Studies on Hydrogenated Amorphous Si1-xCx Films”, Jpn. J. Appl. Phys., Vol.21, No.3, pp.L176-L178, (1982).
  • A. Morimoto, T. Miura, M. Kumeda, T. Shimizu, “Glow Discharge a-Si1-xCx:H Films Studied by ESR and IR measurements”, Jpn. J. Appl. Phys., Vol.21, No.2, pp.L119-L121, (1982).
  • A. Morimoto, T. Miura, M. Kumeda, T. Shimizu, “ESR and IR Studies on a-Si1-xGex:H Prepared by Glow Discharge Decomposition”, Jpn. J. Appl. Phys., Vol.20, No.11, pp.L833-L836, (1981).

電子物理研究室概要に戻る